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Γ-radiation dosimetry using screen printed nickel oxide thick films

    • University of Limerick
    • Department of Electronic and Computer Engineering

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    Thick films of Nickel oxide (NiO) were investigated for γ-radiation dosimetry purposes. Samples were fabricated using the thick film screen printing technique. Absorption spectra for NiO films were recorded and the values of the optical band gap for as-printed, irradiated and annealed films were calculated. It was found that the optical band gap value decreased as the radiation dose was increased. Samples with an Ag-NiO-Ag sandwich structure were exposed to a 60Co γ-radiation source at a dose rate of 6 Gy/min. The relative change in current increased linearly with increased dosage up to 720 Gy. The I-V characteristics indicated a Poole-Frenkel conduction mechanism. It was found that annealing restored both the electrical and the optical properties of the samples.

    Original languageEnglish
    Title of host publication2002 23rd International Conference on Microelectronics, MIEL 2002 - Proceedings
    PublisherIEEE Computer Society
    Pages357-360
    Number of pages4
    ISBN (Print)0780372352, 9780780372351
    DOIs
    Publication statusPublished - 2002
    Event2002 23rd International Conference on Microelectronics, MIEL 2002 - Nis, Serbia
    Duration: 12 May 200215 May 2002

    Publication series

    Name2002 23rd International Conference on Microelectronics, MIEL 2002 - Proceedings
    Volume1

    Conference

    Conference2002 23rd International Conference on Microelectronics, MIEL 2002
    Country/TerritorySerbia
    CityNis
    Period12/05/0215/05/02

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