TY - JOUR
T1 - A mathematical model for the cleansing of silicon substrates by fluid immersion
AU - O'Brien, S. B.G.
AU - Van Den Brule, B. H.A.A.
PY - 1991/6
Y1 - 1991/6
N2 - The importance of cleanliness for the efficient manufacture of integrated circuits is well known in the microprocessor industry. The efficiency of traditional cleansing methods is known to decrease dramatically for dirt particles smaller than about 1 μm in radius. Experimentally it has been shown that the passage of a liquid-gas phase boundary along a substrate can be exploited to effect particle removal. A model is derived here which explains the success of this process, illustrates the dependency of the method on the speed of immersion, and further shows that it is theoretically independent of particle size.
AB - The importance of cleanliness for the efficient manufacture of integrated circuits is well known in the microprocessor industry. The efficiency of traditional cleansing methods is known to decrease dramatically for dirt particles smaller than about 1 μm in radius. Experimentally it has been shown that the passage of a liquid-gas phase boundary along a substrate can be exploited to effect particle removal. A model is derived here which explains the success of this process, illustrates the dependency of the method on the speed of immersion, and further shows that it is theoretically independent of particle size.
UR - http://www.scopus.com/inward/record.url?scp=0026172620&partnerID=8YFLogxK
U2 - 10.1016/0021-9797(91)90252-4
DO - 10.1016/0021-9797(91)90252-4
M3 - Article
AN - SCOPUS:0026172620
SN - 0021-9797
VL - 144
SP - 210
EP - 221
JO - Journal of Colloid and Interface Science
JF - Journal of Colloid and Interface Science
IS - 1
ER -