A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration

Nordine Hendaoui; Aladin Mani; Ning Liu; Syed M. Tofail; Christophe Silien; André Peremans

doi:10.1016/j.optcom.2016.08.034

A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration

Nordine Hendaoui, Aladin Mani, Ning Liu, Syed M. Tofail, Christophe Silien, André Peremans

Department of Physics

Research output: Contribution to journal › Article › peer-review

Abstract

A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH₂)₁₇-SiCl₃]), when probing the methyl modes located near 3.5 micrometres.

Original language	English
Pages (from-to)	574-579
Number of pages	6
Journal	Optics Communications
Volume	382
DOIs	https://doi.org/10.1016/j.optcom.2016.08.034
Publication status	Published - 1 Jan 2017

Keywords

ATR configuration
Far field
Infrared microscopy
Label free
Super-resolution

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10.1016/j.optcom.2016.08.034

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title = "A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration",

abstract = "A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.",

keywords = "ATR configuration, Far field, Infrared microscopy, Label free, Super-resolution",

author = "Nordine Hendaoui and Aladin Mani and Ning Liu and Tofail, {Syed M.} and Christophe Silien and Andr{\'e} Peremans",

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AU - Hendaoui, Nordine

AU - Mani, Aladin

AU - Liu, Ning

AU - Tofail, Syed M.

AU - Silien, Christophe

AU - Peremans, André

PY - 2017/1/1

Y1 - 2017/1/1

N2 - A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.

AB - A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.

KW - ATR configuration

KW - Far field

KW - Infrared microscopy

KW - Label free

KW - Super-resolution

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VL - 382

SP - 574

EP - 579

JO - Optics Communications

JF - Optics Communications

ER -

A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration

Abstract

Keywords

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