A simple, low-cost CVD route to thin films of BiFeO3 for efficient water photo-oxidation

Savio J.A. Moniz; Raul Quesada-Cabrera; Christopher S. Blackman; Junwang Tang; Paul Southern; Paul M. Weaver; Claire J. Carmalt

doi:10.1039/c3ta14824f

A simple, low-cost CVD route to thin films of BiFeO₃ for efficient water photo-oxidation

Savio J.A. Moniz, Raul Quesada-Cabrera, Christopher S. Blackman, Junwang Tang, Paul Southern, Paul M. Weaver, Claire J. Carmalt

Research output: Contribution to journal › Article › peer-review

Abstract

A novel method for preparation of BiFeO₃ films via a simple solution-based CVD method is reported using for the first time a single-source heterobimetallic precursor [CpFe(CO)₂BiCl₂]. BiFeO ₃ films display ferroelectric and ferromagnetic ordering at room temperature and possess direct band-gaps between 2.0 and 2.2 eV. Photocatalytic testing for water oxidation revealed high activities under UVA (365 nm) and simulated solar irradiation, superior to that exhibited by a commercial standard (Pilkington Activ® TiO₂ film) resulting in an apparent quantum yield of ∼24%.

Original language	English
Pages (from-to)	2922-2927
Number of pages	6
Journal	Journal of Materials Chemistry A
Volume	2
Issue number	9
DOIs	https://doi.org/10.1039/c3ta14824f
Publication status	Published - 7 Mar 2014
Externally published	Yes

Access to Document

10.1039/c3ta14824f

Cite this

@article{b560480922054e978c96eb31524c9895,

title = "A simple, low-cost CVD route to thin films of BiFeO3 for efficient water photo-oxidation",

abstract = "A novel method for preparation of BiFeO3 films via a simple solution-based CVD method is reported using for the first time a single-source heterobimetallic precursor [CpFe(CO)2BiCl2]. BiFeO 3 films display ferroelectric and ferromagnetic ordering at room temperature and possess direct band-gaps between 2.0 and 2.2 eV. Photocatalytic testing for water oxidation revealed high activities under UVA (365 nm) and simulated solar irradiation, superior to that exhibited by a commercial standard (Pilkington Activ{\textregistered} TiO2 film) resulting in an apparent quantum yield of ∼24%.",

author = "Moniz, {Savio J.A.} and Raul Quesada-Cabrera and Blackman, {Christopher S.} and Junwang Tang and Paul Southern and Weaver, {Paul M.} and Carmalt, {Claire J.}",

year = "2014",

month = mar,

day = "7",

doi = "10.1039/c3ta14824f",

language = "English",

volume = "2",

pages = "2922--2927",

journal = "Journal of Materials Chemistry A",

issn = "2050-7488",

number = "9",

}

TY - JOUR

T1 - A simple, low-cost CVD route to thin films of BiFeO3 for efficient water photo-oxidation

AU - Moniz, Savio J.A.

AU - Quesada-Cabrera, Raul

AU - Blackman, Christopher S.

AU - Tang, Junwang

AU - Southern, Paul

AU - Weaver, Paul M.

AU - Carmalt, Claire J.

PY - 2014/3/7

Y1 - 2014/3/7

N2 - A novel method for preparation of BiFeO3 films via a simple solution-based CVD method is reported using for the first time a single-source heterobimetallic precursor [CpFe(CO)2BiCl2]. BiFeO 3 films display ferroelectric and ferromagnetic ordering at room temperature and possess direct band-gaps between 2.0 and 2.2 eV. Photocatalytic testing for water oxidation revealed high activities under UVA (365 nm) and simulated solar irradiation, superior to that exhibited by a commercial standard (Pilkington Activ® TiO2 film) resulting in an apparent quantum yield of ∼24%.

AB - A novel method for preparation of BiFeO3 films via a simple solution-based CVD method is reported using for the first time a single-source heterobimetallic precursor [CpFe(CO)2BiCl2]. BiFeO 3 films display ferroelectric and ferromagnetic ordering at room temperature and possess direct band-gaps between 2.0 and 2.2 eV. Photocatalytic testing for water oxidation revealed high activities under UVA (365 nm) and simulated solar irradiation, superior to that exhibited by a commercial standard (Pilkington Activ® TiO2 film) resulting in an apparent quantum yield of ∼24%.

UR - http://www.scopus.com/inward/record.url?scp=84893496516&partnerID=8YFLogxK

U2 - 10.1039/c3ta14824f

DO - 10.1039/c3ta14824f

M3 - Article

AN - SCOPUS:84893496516

SN - 2050-7488

VL - 2

SP - 2922

EP - 2927

JO - Journal of Materials Chemistry A

JF - Journal of Materials Chemistry A

IS - 9

ER -

A simple, low-cost CVD route to thin films of BiFeO₃ for efficient water photo-oxidation

Abstract

Access to Document

Other files and links

Fingerprint

Cite this