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A simple, low-cost CVD route to thin films of BiFeO3 for efficient water photo-oxidation

  • Savio J.A. Moniz
  • , Raul Quesada-Cabrera
  • , Christopher S. Blackman
  • , Junwang Tang
  • , Paul Southern
  • , Paul M. Weaver
  • , Claire J. Carmalt
  • University College London
  • National Physical Laboratory

Research output: Contribution to journalArticlepeer-review

Abstract

A novel method for preparation of BiFeO3 films via a simple solution-based CVD method is reported using for the first time a single-source heterobimetallic precursor [CpFe(CO)2BiCl2]. BiFeO 3 films display ferroelectric and ferromagnetic ordering at room temperature and possess direct band-gaps between 2.0 and 2.2 eV. Photocatalytic testing for water oxidation revealed high activities under UVA (365 nm) and simulated solar irradiation, superior to that exhibited by a commercial standard (Pilkington Activ® TiO2 film) resulting in an apparent quantum yield of ∼24%.

Original languageEnglish
Pages (from-to)2922-2927
Number of pages6
JournalJournal of Materials Chemistry A
Volume2
Issue number9
DOIs
Publication statusPublished - 7 Mar 2014
Externally publishedYes

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