Abstract
Confined in a molecular corral: A supramolecular network changes the mechanism by which underpotential deposition (UPD) of copper proceeds on a gold electrode modified by a selfassembled monolayer (SAM). Lateral diffusion of Cu adatoms is suppressed between adjacent cells of a network/SAM hybrid structure. Instead, UPD occurs by direct deposition into the SAM filled pores of the network, where the Cu adatoms are confined.
Original language | English |
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Pages (from-to) | 3349-3352 |
Number of pages | 4 |
Journal | Angewandte Chemie - International Edition |
Volume | 48 |
Issue number | 18 |
DOIs | |
Publication status | Published - 20 Apr 2009 |
Externally published | Yes |