A supramolecular hydrogen-bonded network as a diffusion barrier for metal adatoms

Christophe Silien, Minna T. Räis̈nen, Manfred Buck

Research output: Contribution to journalArticlepeer-review

Abstract

Confined in a molecular corral: A supramolecular network changes the mechanism by which underpotential deposition (UPD) of copper proceeds on a gold electrode modified by a selfassembled monolayer (SAM). Lateral diffusion of Cu adatoms is suppressed between adjacent cells of a network/SAM hybrid structure. Instead, UPD occurs by direct deposition into the SAM filled pores of the network, where the Cu adatoms are confined.

Original languageEnglish
Pages (from-to)3349-3352
Number of pages4
JournalAngewandte Chemie - International Edition
Volume48
Issue number18
DOIs
Publication statusPublished - 20 Apr 2009
Externally publishedYes

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