Analysis of multiple process flows in an asic fab with a detailed photolithography area model

ASIC fabs are characterized by multiple process flows. This is mainly due to the highly diversified product portfolios within such fabs. In this study, we first examined the cycle time for individual process flows in a medium volume ASIC fab. We compared these process flows in terms of overall cycle time and using a cycle time index. Secondly, focusing on photolithography we developed a simulation model that employs cycle time data to analyze the impacts of process flow diversity. Thirdly, we used this model to examine the impact on cycle time of changing the volumes of wafer starts on different process flows. The detailed results of simulation experiments along with the concluding remarks are given at the end of the study.