Band-gap engineering in TiOx and TiOx-Ni thin films by plasma-enhanced atomic layer deposition: Structural and optical insights

J. A. Hernandez-Marquez; D. O’Neill; M. Snelgrove; A. I. Gonzalez-Jacquez; O. Solis-Canto; P. Tanabat; R. O’Connor; J. R. Farias-Mancilla; J. T. Elizalde-Galindo; P. G. Mani-Gonzalez

doi:10.1557/s43579-025-00900-z

Band-gap engineering in TiOx and TiOx-Ni thin films by plasma-enhanced atomic layer deposition: Structural and optical insights

J. A. Hernandez-Marquez
, D. O’Neill
, M. Snelgrove
, A. I. Gonzalez-Jacquez
, O. Solis-Canto
, P. Tanabat
, R. O’Connor
, J. R. Farias-Mancilla
, J. T. Elizalde-Galindo
, P. G. Mani-Gonzalez

Research output: Contribution to journal › Article › peer-review

Abstract

Rutile and anatase phases promote spatial charge separation which leads to a rise in photocatalytic activity. In addition, the fact that the thin film increases its photocatalytic activity when it is doped with another metal such as Ni is an important case of study. This doping technique enhances the wavelength threshold for initiating photocatalytic activity, rendering the photocatalytic effective at ~ 380 nm. TiO₂ thin films were deposited through PE (plasma enhanced)-ALD with ~ 5 nm thickness by TDMAT and O₂ plasma as precursors. Samples were characterized using GAXRD (grazing angle x-ray diffraction), Ellipsometry spectroscopy, and XPS (X-ray photoelectron spectroscopy).

Original language	English
Journal	MRS Communications
DOIs	https://doi.org/10.1557/s43579-025-00900-z
Publication status	Accepted/In press - 2025
Externally published	Yes

Keywords

Atomic layer deposition
Crystallographic structure
Interface
Optical properties
Plasma deposition

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10.1557/s43579-025-00900-z

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Hernandez-Marquez, J. A., O’Neill, D., Snelgrove, M., Gonzalez-Jacquez, A. I., Solis-Canto, O., Tanabat, P., O’Connor, R., Farias-Mancilla, J. R., Elizalde-Galindo, J. T., & Mani-Gonzalez, P. G. (Accepted/In press). Band-gap engineering in TiOx and TiOx-Ni thin films by plasma-enhanced atomic layer deposition: Structural and optical insights. MRS Communications. https://doi.org/10.1557/s43579-025-00900-z

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title = "Band-gap engineering in TiOx and TiOx-Ni thin films by plasma-enhanced atomic layer deposition: Structural and optical insights",

abstract = "Rutile and anatase phases promote spatial charge separation which leads to a rise in photocatalytic activity. In addition, the fact that the thin film increases its photocatalytic activity when it is doped with another metal such as Ni is an important case of study. This doping technique enhances the wavelength threshold for initiating photocatalytic activity, rendering the photocatalytic effective at \textasciitilde{} 380 nm. TiO2 thin films were deposited through PE (plasma enhanced)-ALD with \textasciitilde{} 5 nm thickness by TDMAT and O2 plasma as precursors. Samples were characterized using GAXRD (grazing angle x-ray diffraction), Ellipsometry spectroscopy, and XPS (X-ray photoelectron spectroscopy).",

keywords = "Atomic layer deposition, Crystallographic structure, Interface, Optical properties, Plasma deposition",

author = "Hernandez-Marquez, \{J. A.\} and D. O{\textquoteright}Neill and M. Snelgrove and Gonzalez-Jacquez, \{A. I.\} and O. Solis-Canto and P. Tanabat and R. O{\textquoteright}Connor and Farias-Mancilla, \{J. R.\} and Elizalde-Galindo, \{J. T.\} and Mani-Gonzalez, \{P. G.\}",

note = "Publisher Copyright: {\textcopyright} The Author(s), under exclusive licence to The Materials Research Society 2025.",

year = "2025",

doi = "10.1557/s43579-025-00900-z",

language = "English",

journal = "MRS Communications",

issn = "2159-6859",

}

Hernandez-Marquez, JA, O’Neill, D, Snelgrove, M, Gonzalez-Jacquez, AI, Solis-Canto, O, Tanabat, P, O’Connor, R, Farias-Mancilla, JR, Elizalde-Galindo, JT & Mani-Gonzalez, PG 2025, 'Band-gap engineering in TiOx and TiOx-Ni thin films by plasma-enhanced atomic layer deposition: Structural and optical insights', MRS Communications. https://doi.org/10.1557/s43579-025-00900-z

TY - JOUR

T1 - Band-gap engineering in TiOx and TiOx-Ni thin films by plasma-enhanced atomic layer deposition

T2 - Structural and optical insights

AU - Hernandez-Marquez, J. A.

AU - O’Neill, D.

AU - Snelgrove, M.

AU - Gonzalez-Jacquez, A. I.

AU - Solis-Canto, O.

AU - Tanabat, P.

AU - O’Connor, R.

AU - Farias-Mancilla, J. R.

AU - Elizalde-Galindo, J. T.

AU - Mani-Gonzalez, P. G.

PY - 2025

Y1 - 2025

N2 - Rutile and anatase phases promote spatial charge separation which leads to a rise in photocatalytic activity. In addition, the fact that the thin film increases its photocatalytic activity when it is doped with another metal such as Ni is an important case of study. This doping technique enhances the wavelength threshold for initiating photocatalytic activity, rendering the photocatalytic effective at ~ 380 nm. TiO2 thin films were deposited through PE (plasma enhanced)-ALD with ~ 5 nm thickness by TDMAT and O2 plasma as precursors. Samples were characterized using GAXRD (grazing angle x-ray diffraction), Ellipsometry spectroscopy, and XPS (X-ray photoelectron spectroscopy).

AB - Rutile and anatase phases promote spatial charge separation which leads to a rise in photocatalytic activity. In addition, the fact that the thin film increases its photocatalytic activity when it is doped with another metal such as Ni is an important case of study. This doping technique enhances the wavelength threshold for initiating photocatalytic activity, rendering the photocatalytic effective at ~ 380 nm. TiO2 thin films were deposited through PE (plasma enhanced)-ALD with ~ 5 nm thickness by TDMAT and O2 plasma as precursors. Samples were characterized using GAXRD (grazing angle x-ray diffraction), Ellipsometry spectroscopy, and XPS (X-ray photoelectron spectroscopy).

KW - Atomic layer deposition

KW - Crystallographic structure

KW - Interface

KW - Optical properties

KW - Plasma deposition

UR - https://www.scopus.com/pages/publications/105025556992

U2 - 10.1557/s43579-025-00900-z

DO - 10.1557/s43579-025-00900-z

M3 - Article

AN - SCOPUS:105025556992

SN - 2159-6859

JO - MRS Communications

JF - MRS Communications

ER -

Band-gap engineering in TiOx and TiOx-Ni thin films by plasma-enhanced atomic layer deposition: Structural and optical insights

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Keywords

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