Current-line oriented pore formation in n-InP anodized in KOH

N. Quill, R. P. Lynch, C. O'Dwyer, D. N. Buckley

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Electrochemically formed pores in InP in KOH switch from being crystallographically oriented (CO) to being current-line oriented (CLO) above a specific potential in both 17 mol dm-3 and 2.5 mol dm-3 KOH at a temperature of 10°C. The CLO pores formed in KOH have roughly elliptical cross sections, and are wider along the 〈011̄〉 than along the perpendicular 〈011〉 direction. The pores can form only when a critical porosity is reached and their formation marks the transition from porous to planar etching. Many of the features of pore formation are explained by evoking the effect that both temperature and electrolyte concentration can have on the effective diffusion length of holes at the semiconductor-solution interface.

Original languageEnglish
Title of host publicationECS Transactions
PublisherElectrochemical Society Inc.
Pages143-153
Number of pages11
Edition37
ISBN (Electronic)9781607685395
DOIs
Publication statusPublished - 2013

Publication series

NameECS Transactions
Number37
Volume50
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

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