TY - GEN
T1 - Effect of γ-radiation on the conduction mechanism of thermal vacuum deposited copper phthalocyanine thin films
AU - Arshak, A.
AU - Zleetni, S. M.
AU - Arshak, K.
AU - Harris, J.
N1 - Publisher Copyright:
© 2001 IEEE.
PY - 2001
Y1 - 2001
N2 - The dosimetry properties of thermally evaporated Copper Phthalocyanine (CuPc) thin films were investigated. The conduction mechanism of the asdeposited films was found to be space-charge-limited and their relative permittivity was within the range reported by others [1,2, 3, 4]. The Poole-Frenkel effect became more dominant for the irradiated samples and they displayed large increase in permittivity and colour centre density, although the energies of their optical band gap and trapping levels did not change. The observed linear relationship between the absorbance at 615 nm and the γ-radiation doses validated the use of CuPc as an optical sensor dosimeter especially for low radiation doses. Samples showed a higher radiation tolerance after being annealed for one hour at a temperature of only 323 K. Annealing also restored their initial electrical and optical properties.
AB - The dosimetry properties of thermally evaporated Copper Phthalocyanine (CuPc) thin films were investigated. The conduction mechanism of the asdeposited films was found to be space-charge-limited and their relative permittivity was within the range reported by others [1,2, 3, 4]. The Poole-Frenkel effect became more dominant for the irradiated samples and they displayed large increase in permittivity and colour centre density, although the energies of their optical band gap and trapping levels did not change. The observed linear relationship between the absorbance at 615 nm and the γ-radiation doses validated the use of CuPc as an optical sensor dosimeter especially for low radiation doses. Samples showed a higher radiation tolerance after being annealed for one hour at a temperature of only 323 K. Annealing also restored their initial electrical and optical properties.
UR - https://www.scopus.com/pages/publications/84949229660
U2 - 10.1109/NANO.2001.966426
DO - 10.1109/NANO.2001.966426
M3 - Conference contribution
AN - SCOPUS:84949229660
T3 - Proceedings of the IEEE Conference on Nanotechnology
SP - 238
EP - 242
BT - Proceedings of the 2001 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001
PB - IEEE Computer Society
T2 - 1st IEEE Conference on Nanotechnology, IEEE-NANO 2001
Y2 - 28 October 2001 through 30 October 2001
ER -