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Effect of ECR plasma on the luminescence efficiency of InGaAs and InP

  • F. Ren
  • , D. N. Buckley
  • , K. M. Lee
  • , S. J. Pearton
  • , R. A. Bartynski
  • , C. Constantine
  • , W. S. Hobson
  • , R. A. Hamm
  • , P. C. Chao
  • Nokia
  • University of Florida
  • Rutgers - The State University of New Jersey, New Brunswick
  • Plasma Therm Inc.
  • Martin Marietta Corporation

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