Electrochemical pore formation in InP: Understanding and controlling pore morphology

Nathan Quill, Laura Green, Colm O'Dwyer, D. Noel Buckley, Robert P. Lynch

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Pores formed anodically in InP at different temperatures, electrolyte (KOH) concentrations, carrier concentrations and current densities exhibit significant pore width variations. The pore width decreases as the temperature, carrier concentration or current density are increased. The pore width also decreases when the KOH concentration is increased up to 9 mol dm-3, but increases slightly as the concentration is increased further. These pore width variations are explained by a three-step model for pore formation based on competition in kinetics between the different steps in the etching mechanism. The variation of pore width with current density is explained explicitly in terms of the crystallographic etching mechanism and this is supported by observation of the different crystallographic features of the pore cross section at different current densities.

Original languageEnglish
Title of host publicationState-of-the-Art Program on Compound Semiconductors 59 (SOTAPOCS 59)
EditorsM. Overberg, W. Johnson, T. Anderson, J. Hite
PublisherElectrochemical Society Inc.
Pages29-43
Number of pages15
Edition40
ISBN (Electronic)9781607687894
DOIs
Publication statusPublished - 2016
EventSymposium on State-of-the-Art Program on Compound Semiconductors 59, SOTAPOCS 2016 - PRiME 2016/230th ECS Meeting - Honolulu, United States
Duration: 2 Oct 20167 Oct 2016

Publication series

NameECS Transactions
Number40
Volume75
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

ConferenceSymposium on State-of-the-Art Program on Compound Semiconductors 59, SOTAPOCS 2016 - PRiME 2016/230th ECS Meeting
Country/TerritoryUnited States
CityHonolulu
Period2/10/167/10/16

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