Factors that influence ionic migration on printed wiring boards

M. Reid, J. Punch, B. Rodgers, M. J. Pomeroy, T. Galkin, T. Stenberg, O. Rusanen, E. Elonen, M. Vilèn, K. Väkeväinen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Ionic migration on printed wiring boards (PWBs) involves the transport of metal ions between two copper tracks under bias through an aqueous electrolyte, which results in deposition at the cathode. Dendrite-like deposits are then formed, leading to a short circuit and subsequent failure. Standardised test 85°C/85%RH (relative humidity) is typically used for modelling and predicting ionic migration failure, however, the possibility of moisture condensation - a prerequisite for ionic migration - at such a relatively high temperature and low relative humidity is unlikely. In order to assess the effects of moisture condensation, this work compares two extreme tests for ionic migration on PWBs. The two tests are water droplet (WD) and cyclic temperature - relative humidity (20°C to 35°C, 95%RH maximum, with 21 hr cycle) conditions under a bias of 5V DC. The cyclic test was conducted over a 21 day period with continuous in-situ monitoring of dendritic growth. Water drop tests were performed in order to draw correlation with cyclic tests. Investigative techniques were conducted to evaluate the migration development on the PWBs after testing using optical microscopy, scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDS).

Original languageEnglish
Title of host publication2005 IEEE International Reliability Physics Symposium Proceedings, 43rd Annual
Pages300-304
Number of pages5
Publication statusPublished - 2005
Event2005 IEEE International Reliability Physics Symposium Proceedings, 43rd Annual - San Jose, CA, United States
Duration: 17 Apr 200521 Apr 2005

Publication series

NameIEEE International Reliability Physics Symposium Proceedings
ISSN (Print)1541-7026

Conference

Conference2005 IEEE International Reliability Physics Symposium Proceedings, 43rd Annual
Country/TerritoryUnited States
CitySan Jose, CA
Period17/04/0521/04/05

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