Fully porous GaN p-n junctions fabricated by chemical vapor deposition: A green technology towards more efficient LEDs

J. J. Carvajal, J. Mena, O. V. Bilousov, O. Martínez, J. Jiménez, V. Z. Zubialevich, P. J. Parbrook, H. Geaney, C. O'Dwyer, F. Díaz, M. Aguiló

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Porous GaN based LEDs produced by corrosion etching techniques have demonstrated enhanced light extraction efficiencies in the past. However, these fabrication techniques require further post-growth processing steps, which increase the price of the final device. In this paper, we review the process we developed for the formation of fully porous GaN p-n junctions directly during growth, using a sequential chemical vapor deposition (CVD) process to produce the different layers that form the p-n junction.

Original languageEnglish
Title of host publicationWide Bandgap Semiconductor Materials and Devices 16
EditorsS. Jang, K. Shenai, G. W. Hunter, F. Ren, C. O'Dwyer, K. C. Mishra
PublisherElectrochemical Society Inc.
Pages163-176
Number of pages14
Edition1
ISBN (Electronic)9781607685913
DOIs
Publication statusPublished - 2015
Externally publishedYes
EventSymposium on Wide Bandgap Semiconductor Materials and Devices 16 - 227th ECS Meeting - Chicago, United States
Duration: 24 May 201528 May 2015

Publication series

NameECS Transactions
Number1
Volume66
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

ConferenceSymposium on Wide Bandgap Semiconductor Materials and Devices 16 - 227th ECS Meeting
Country/TerritoryUnited States
CityChicago
Period24/05/1528/05/15

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