Abstract
Porous GaN based LEDs produced by corrosion etching techniques have demonstrated enhanced light extraction efficiencies in the past. However, these fabrication techniques require further post-growth processing steps, which increase the price of the final device. In this paper, we review the process we developed for the formation of fully porous GaN p-n junctions directly during growth, using a sequential chemical vapor deposition (CVD) process to produce the different layers that form the p-n junction.
| Original language | English |
|---|---|
| Title of host publication | Wide Bandgap Semiconductor Materials and Devices 16 |
| Editors | S. Jang, K. Shenai, G. W. Hunter, F. Ren, C. O'Dwyer, K. C. Mishra |
| Publisher | Electrochemical Society Inc. |
| Pages | 163-176 |
| Number of pages | 14 |
| Edition | 1 |
| ISBN (Electronic) | 9781607685913 |
| DOIs | |
| Publication status | Published - 2015 |
| Externally published | Yes |
| Event | Symposium on Wide Bandgap Semiconductor Materials and Devices 16 - 227th ECS Meeting - Chicago, United States Duration: 24 May 2015 → 28 May 2015 |
Publication series
| Name | ECS Transactions |
|---|---|
| Number | 1 |
| Volume | 66 |
| ISSN (Print) | 1938-6737 |
| ISSN (Electronic) | 1938-5862 |
Conference
| Conference | Symposium on Wide Bandgap Semiconductor Materials and Devices 16 - 227th ECS Meeting |
|---|---|
| Country/Territory | United States |
| City | Chicago |
| Period | 24/05/15 → 28/05/15 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
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