Fully porous GaN p-n junctions fabricated by chemical vapor deposition: A green technology towards more efficient LEDs

  • J. J. Carvajal
  • , J. Mena
  • , O. V. Bilousov
  • , O. Martínez
  • , J. Jiménez
  • , V. Z. Zubialevich
  • , P. J. Parbrook
  • , H. Geaney
  • , C. O'Dwyer
  • , F. Díaz
  • , M. Aguiló

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Porous GaN based LEDs produced by corrosion etching techniques have demonstrated enhanced light extraction efficiencies in the past. However, these fabrication techniques require further post-growth processing steps, which increase the price of the final device. In this paper, we review the process we developed for the formation of fully porous GaN p-n junctions directly during growth, using a sequential chemical vapor deposition (CVD) process to produce the different layers that form the p-n junction.

Original languageEnglish
Title of host publicationWide Bandgap Semiconductor Materials and Devices 16
EditorsS. Jang, K. Shenai, G. W. Hunter, F. Ren, C. O'Dwyer, K. C. Mishra
PublisherElectrochemical Society Inc.
Pages163-176
Number of pages14
Edition1
ISBN (Electronic)9781607685913
DOIs
Publication statusPublished - 2015
Externally publishedYes
EventSymposium on Wide Bandgap Semiconductor Materials and Devices 16 - 227th ECS Meeting - Chicago, United States
Duration: 24 May 201528 May 2015

Publication series

NameECS Transactions
Number1
Volume66
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

ConferenceSymposium on Wide Bandgap Semiconductor Materials and Devices 16 - 227th ECS Meeting
Country/TerritoryUnited States
CityChicago
Period24/05/1528/05/15

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