Highly selective CO2 removal for one-step liquefied natural gas processing by physisorbents

David G. Madden, Daniel O'Nolan, Kai Jie Chen, Carol Hua, Amrit Kumar, Tony Pham, Katherine A. Forrest, Brian Space, John J. Perry, Majeda Khraisheh, Michael J. Zaworotko

Research output: Contribution to journalArticlepeer-review

Abstract

Industrial specifications require CO2 concentrations in natural gas below 50 ppm during liquefaction because of corrosion and CO2 freezing. Herein, we report a physisorbent (TIFSIX-3-Ni) that exhibits new benchmark CO2/CH4 selectivity and fast kinetics, thereby enabling one-step LNG processing to CO2 levels of 25 ppm.

Original languageEnglish
Pages (from-to)3219-3222
Number of pages4
JournalChemical Communications
Volume55
Issue number22
DOIs
Publication statusPublished - 2019

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