Highly selective CO2 removal for one-step liquefied natural gas processing by physisorbents

  • David G. Madden
  • , Daniel O'Nolan
  • , Kai Jie Chen
  • , Carol Hua
  • , Amrit Kumar
  • , Tony Pham
  • , Katherine A. Forrest
  • , Brian Space
  • , John J. Perry
  • , Majeda Khraisheh
  • , Michael J. Zaworotko

Research output: Contribution to journalArticlepeer-review

Abstract

Industrial specifications require CO2 concentrations in natural gas below 50 ppm during liquefaction because of corrosion and CO2 freezing. Herein, we report a physisorbent (TIFSIX-3-Ni) that exhibits new benchmark CO2/CH4 selectivity and fast kinetics, thereby enabling one-step LNG processing to CO2 levels of 25 ppm.

Original languageEnglish
Pages (from-to)3219-3222
Number of pages4
JournalChemical Communications
Volume55
Issue number22
DOIs
Publication statusPublished - 2019

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