Highly selective CO2 removal for one-step liquefied natural gas processing by physisorbents

David G. Madden; Daniel O'Nolan; Kai Jie Chen; Carol Hua; Amrit Kumar; Tony Pham; Katherine A. Forrest; Brian Space; John J. Perry; Majeda Khraisheh; Michael J. Zaworotko

doi:10.1039/c9cc00626e

Highly selective CO₂ removal for one-step liquefied natural gas processing by physisorbents

David G. Madden
, Daniel O'Nolan
, Kai Jie Chen
, Carol Hua
, Amrit Kumar
, Tony Pham
, Katherine A. Forrest
, Brian Space
, John J. Perry
, Majeda Khraisheh
, Michael J. Zaworotko

Research output: Contribution to journal › Article › peer-review

Abstract

Industrial specifications require CO₂ concentrations in natural gas below 50 ppm during liquefaction because of corrosion and CO₂ freezing. Herein, we report a physisorbent (TIFSIX-3-Ni) that exhibits new benchmark CO₂/CH₄ selectivity and fast kinetics, thereby enabling one-step LNG processing to CO₂ levels of 25 ppm.

Original language	English
Pages (from-to)	3219-3222
Number of pages	4
Journal	Chemical Communications
Volume	55
Issue number	22
DOIs	https://doi.org/10.1039/c9cc00626e
Publication status	Published - 2019

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SDG 13 Climate Action

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10.1039/c9cc00626e

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title = "Highly selective CO2 removal for one-step liquefied natural gas processing by physisorbents",

abstract = "Industrial specifications require CO2 concentrations in natural gas below 50 ppm during liquefaction because of corrosion and CO2 freezing. Herein, we report a physisorbent (TIFSIX-3-Ni) that exhibits new benchmark CO2/CH4 selectivity and fast kinetics, thereby enabling one-step LNG processing to CO2 levels of 25 ppm.",

author = "Madden, \{David G.\} and Daniel O'Nolan and Chen, \{Kai Jie\} and Carol Hua and Amrit Kumar and Tony Pham and Forrest, \{Katherine A.\} and Brian Space and Perry, \{John J.\} and Majeda Khraisheh and Zaworotko, \{Michael J.\}",

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doi = "10.1039/c9cc00626e",

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T1 - Highly selective CO2 removal for one-step liquefied natural gas processing by physisorbents

AU - Madden, David G.

AU - O'Nolan, Daniel

AU - Chen, Kai Jie

AU - Hua, Carol

AU - Kumar, Amrit

AU - Pham, Tony

AU - Forrest, Katherine A.

AU - Space, Brian

AU - Perry, John J.

AU - Khraisheh, Majeda

AU - Zaworotko, Michael J.

PY - 2019

Y1 - 2019

N2 - Industrial specifications require CO2 concentrations in natural gas below 50 ppm during liquefaction because of corrosion and CO2 freezing. Herein, we report a physisorbent (TIFSIX-3-Ni) that exhibits new benchmark CO2/CH4 selectivity and fast kinetics, thereby enabling one-step LNG processing to CO2 levels of 25 ppm.

AB - Industrial specifications require CO2 concentrations in natural gas below 50 ppm during liquefaction because of corrosion and CO2 freezing. Herein, we report a physisorbent (TIFSIX-3-Ni) that exhibits new benchmark CO2/CH4 selectivity and fast kinetics, thereby enabling one-step LNG processing to CO2 levels of 25 ppm.

UR - https://www.scopus.com/pages/publications/85062765460

U2 - 10.1039/c9cc00626e

DO - 10.1039/c9cc00626e

M3 - Article

C2 - 30806425

AN - SCOPUS:85062765460

SN - 1359-7345

VL - 55

SP - 3219

EP - 3222

JO - Chemical Communications

JF - Chemical Communications

IS - 22

ER -

Highly selective CO₂ removal for one-step liquefied natural gas processing by physisorbents

Abstract

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