Abstract
Photolithography plays a key role in semiconductor manufacturing systems. In this paper, we address the capacity allocation problem in the photolithography area (CAPPA) subject to machine dedication and tool capability constraints. After proposing the mathematical model of the considered problem, we present a new genetic algorithm named RGA which was derived from a psychological concept called Reference Group in society. Finally, to evaluate the efficiency of the algorithm, we solve a real case study problem from a semiconductor manufacturing company in Ireland and compare the results with one of the genetic algorithms proposed in the literature. Results show the effectiveness and efficiency of RGA to solve CAPPA in a reasonable time.
| Original language | English |
|---|---|
| Title of host publication | WSC 2018 - 2018 Winter Simulation Conference |
| Subtitle of host publication | Simulation for a Noble Cause |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 3696-3707 |
| Number of pages | 12 |
| ISBN (Electronic) | 9781538665725 |
| DOIs | |
| Publication status | Published - 2 Jul 2018 |
| Event | 2018 Winter Simulation Conference, WSC 2018 - Gothenburg, Sweden Duration: 9 Dec 2018 → 12 Dec 2018 |
Publication series
| Name | Proceedings - Winter Simulation Conference |
|---|---|
| Volume | 2018-December |
| ISSN (Print) | 0891-7736 |
Conference
| Conference | 2018 Winter Simulation Conference, WSC 2018 |
|---|---|
| Country/Territory | Sweden |
| City | Gothenburg |
| Period | 9/12/18 → 12/12/18 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
-
SDG 9 Industry, Innovation, and Infrastructure
Fingerprint
Dive into the research topics of 'Implementing a new genetic algorithm to solve the capacity allocation problem in the photolithography area'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver