Abstract
This paper introduces a new concept in the detection and monitoring of the electric field intensity in high power microwave cavities. It is proposed that the optical emission intensity of a low -pressure gas plasma discharge can be used to describe the strength of the microwave electric field that is powering the plasma. This paper discusses the principles of microwave generated plasmas and demonstrates theoretically using Monte Carlo simulations the emission intensity profile of various gas discharges at varying powers at 2.45GHz and 10GHz. A potential probe design, which uses an optical fibre to couple the discharge emission to a remote photodetector, is also introduced. It is aimed to demonstrate the potential for a new technology that will enable the convenient management of applied microwave power and its spatial distribution.
| Original language | English |
|---|---|
| Article number | 56 |
| Pages (from-to) | 460-467 |
| Number of pages | 8 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 5826 |
| DOIs | |
| Publication status | Published - 2005 |
| Event | Opto-Ireland 2005: Optical Sensing and Spectroscopy - Dublin, Ireland Duration: 4 Apr 2005 → 6 Apr 2005 |
Keywords
- Microwave Plasma Discharges
- Monte Carlo Analysis
- Optical Monitoring of Electric Field Intensity
- Optical Probe