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Microstructural development of copper sulfide on copper exposed to humid H2 S
M. Reid
,
J. Punch
,
C. Ryan
, L. F. Garfias
,
S. Belochapkine
, J. P. Franey
, G. E. Derkits
, W. D. Reents
School of Engineering
Office of the Dean Humanities
University of Limerick
The Electrochemical Society
S. C. Johnson & Son Inc
Nokia
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Engineering
Focused Ion Beam
100%
Ray Diffraction
50%
Pure Copper
50%
Hydrogen Sulfide
50%
Cuprite
50%
Critical Thickness
50%
Relative Humidity
50%
Corrosion Product
50%
Energy Dispersive X-Ray Spectroscopy Analysis
50%
Internal Stress
50%
Test Chamber
50%
Material Science
Corrosion
100%
Focused Ion Beam
50%
X-Ray Diffraction
25%
Scanning Electron Microscopy
25%
Film
25%
Secondary Ion Mass Spectrometry
25%
X-Ray Spectroscopy
25%
Film Growth
25%