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Oxidation-induced stresses in the isolation oxidation of silicon
J. D. Evans
,
M. Vynnycky
, S. P. Ferro
Aberystwyth University
University of Bath, Department of Mathematical Sciences
KTH Royal Institute of Technology
Consejo Nacional de Investigaciones Científicas y Técnicas
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Engineering
Dimensional Form
50%
Discretization Scheme
50%
Experimental Result
50%
Induced Stress
100%
Nitride
50%
Numerical Scheme
50%
Oxide Thickness
50%
Rigidity
50%
Silicon Oxide
50%
Two Dimensional
50%
Material Science
Nitride Compound
25%
Oxide Compound
100%
Oxide Interface
50%
Rigidity
25%
Silicon
100%
Chemical Engineering
Nitride
100%
Silicon Oxide
100%