TY - JOUR
T1 - Plasma-enhanced atomic layer deposition of nickel and nickel oxide on silicon for photoelectrochemical applications
AU - O’Donnell, S.
AU - O’Neill, D.
AU - Shiel, K.
AU - Snelgrove, M.
AU - Jose, F.
AU - McFeely, C.
AU - O’Connor, R.
N1 - Publisher Copyright:
© 2023 The Author(s). Published by IOP Publishing Ltd.
PY - 2023/10/12
Y1 - 2023/10/12
N2 - The production of hydrogen fuel through sunlight-driven water splitting has the potential to harness and store large quantities of solar energy in a clean and scalable chemical state, suitable for later use in a range of energy applications. Silicon (Si) possesses many of the required properties to be used effectively as a photoelectrochemical (PEC) water-splitting photoanode. However, its sensitivity to corrosion during the oxygen evolution reaction limits its performance in photoanode applications, thus requiring additional overlayer materials to protect the underlying Si substrate. Nickel oxide (NiO) is one material that acts as an effective protective layer, being transparent, suitably conductive and stable. In this work, we present NiO deposition via state-of-the-art atomic layer deposition and photoemission studies to grow and characterize NiO and Ni-metal protective films. Early-stage nucleation of deposited thin films is illustrated along with the effects of post-deposition annealing and argon milling on depth profile information. Previous reports on the effects of slow argon milling are explored and counter arguments are proposed. Protective films are subjected to PEC testing, which shows enhancement of stability and photocurrent output as a result of the deposited films and plasma annealing on these thin films.
AB - The production of hydrogen fuel through sunlight-driven water splitting has the potential to harness and store large quantities of solar energy in a clean and scalable chemical state, suitable for later use in a range of energy applications. Silicon (Si) possesses many of the required properties to be used effectively as a photoelectrochemical (PEC) water-splitting photoanode. However, its sensitivity to corrosion during the oxygen evolution reaction limits its performance in photoanode applications, thus requiring additional overlayer materials to protect the underlying Si substrate. Nickel oxide (NiO) is one material that acts as an effective protective layer, being transparent, suitably conductive and stable. In this work, we present NiO deposition via state-of-the-art atomic layer deposition and photoemission studies to grow and characterize NiO and Ni-metal protective films. Early-stage nucleation of deposited thin films is illustrated along with the effects of post-deposition annealing and argon milling on depth profile information. Previous reports on the effects of slow argon milling are explored and counter arguments are proposed. Protective films are subjected to PEC testing, which shows enhancement of stability and photocurrent output as a result of the deposited films and plasma annealing on these thin films.
KW - atomic layer deposition
KW - NiO
KW - PEALD
KW - photoelectrochemical
KW - thin films
KW - XPS
UR - http://www.scopus.com/inward/record.url?scp=85165227580&partnerID=8YFLogxK
U2 - 10.1088/1361-6463/ace11a
DO - 10.1088/1361-6463/ace11a
M3 - Article
AN - SCOPUS:85165227580
SN - 0022-3727
VL - 56
JO - Journal of Physics D: Applied Physics
JF - Journal of Physics D: Applied Physics
IS - 41
M1 - 415302
ER -