Abstract
Palladium atoms have been deposited onto graphene where they catalyse etching processes in conjunction with the e-beam, during/after which they reside at the edges of the holes, which have formed in the graphene. Energy filtered imaging reveals that the low loss feature at 2-4 eV constituting the shoulder of the graphene n-plasmon, is up to 10 times enhanced at Pd-decorated graphene edges compared to clean monolayer graphene, rendering it a useful feature for electric field enhancement applications in the optical regime
Original language | English |
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Article number | 012078 |
Journal | Journal of Physics: Conference Series |
Volume | 522 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2014 |
Externally published | Yes |
Event | Electron Microscopy and Analysis Group Conference 2013, EMAG 2013 - York, United Kingdom Duration: 3 Sep 2013 → 6 Sep 2013 |