Size and spatial homogeneity of SiGe quantum dots in amorphous silica matrix

Maja Buljan; Sara R.C. Pinto; Reza J. Kashtiban; Anabela G. Rolo; Adil Chahboun; Ursel Bangert; Sergey Levichev; Václav Hol; Maria J.M. Gomes

doi:10.1063/1.3248373

Size and spatial homogeneity of SiGe quantum dots in amorphous silica matrix

Maja Buljan, Sara R.C. Pinto, Reza J. Kashtiban, Anabela G. Rolo, Adil Chahboun, Ursel Bangert, Sergey Levichev, Václav Hol, Maria J.M. Gomes

Research output: Contribution to journal › Article › peer-review

Abstract

In this paper, we present a study of structural properties of SiGe quantum dots formed in amorphous silica matrix by magnetron sputtering technique. We investigate deposition conditions leading to the formation of dense and uniformly sized quantum dots, distributed homogeneously in the matrix. X-ray and Raman spectroscopy were used to estimate the Si content. A detailed analysis based on grazing incidence small angle x-ray scattering revealed the influence of the deposition conditions on quantum dot sizes, size distributions, spatial arrangement, and concentration of quantum dots in the matrix, as well as the Si:Ge content.

Original language	English
Article number	084319
Journal	Journal of Applied Physics
Volume	106
Issue number	8
DOIs	https://doi.org/10.1063/1.3248373
Publication status	Published - 2009
Externally published	Yes

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title = "Size and spatial homogeneity of SiGe quantum dots in amorphous silica matrix",

abstract = "In this paper, we present a study of structural properties of SiGe quantum dots formed in amorphous silica matrix by magnetron sputtering technique. We investigate deposition conditions leading to the formation of dense and uniformly sized quantum dots, distributed homogeneously in the matrix. X-ray and Raman spectroscopy were used to estimate the Si content. A detailed analysis based on grazing incidence small angle x-ray scattering revealed the influence of the deposition conditions on quantum dot sizes, size distributions, spatial arrangement, and concentration of quantum dots in the matrix, as well as the Si:Ge content.",

author = "Maja Buljan and Pinto, {Sara R.C.} and Kashtiban, {Reza J.} and Rolo, {Anabela G.} and Adil Chahboun and Ursel Bangert and Sergey Levichev and V{\'a}clav Hol and Gomes, {Maria J.M.}",

year = "2009",

doi = "10.1063/1.3248373",

language = "English",

volume = "106",

journal = "Journal of Applied Physics",

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T1 - Size and spatial homogeneity of SiGe quantum dots in amorphous silica matrix

AU - Buljan, Maja

AU - Pinto, Sara R.C.

AU - Kashtiban, Reza J.

AU - Rolo, Anabela G.

AU - Chahboun, Adil

AU - Bangert, Ursel

AU - Levichev, Sergey

AU - Hol, Václav

AU - Gomes, Maria J.M.

PY - 2009

Y1 - 2009

N2 - In this paper, we present a study of structural properties of SiGe quantum dots formed in amorphous silica matrix by magnetron sputtering technique. We investigate deposition conditions leading to the formation of dense and uniformly sized quantum dots, distributed homogeneously in the matrix. X-ray and Raman spectroscopy were used to estimate the Si content. A detailed analysis based on grazing incidence small angle x-ray scattering revealed the influence of the deposition conditions on quantum dot sizes, size distributions, spatial arrangement, and concentration of quantum dots in the matrix, as well as the Si:Ge content.

AB - In this paper, we present a study of structural properties of SiGe quantum dots formed in amorphous silica matrix by magnetron sputtering technique. We investigate deposition conditions leading to the formation of dense and uniformly sized quantum dots, distributed homogeneously in the matrix. X-ray and Raman spectroscopy were used to estimate the Si content. A detailed analysis based on grazing incidence small angle x-ray scattering revealed the influence of the deposition conditions on quantum dot sizes, size distributions, spatial arrangement, and concentration of quantum dots in the matrix, as well as the Si:Ge content.

UR - http://www.scopus.com/inward/record.url?scp=70350745307&partnerID=8YFLogxK

U2 - 10.1063/1.3248373

DO - 10.1063/1.3248373

M3 - Article

AN - SCOPUS:70350745307

SN - 0021-8979

VL - 106

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 8

M1 - 084319

ER -

Size and spatial homogeneity of SiGe quantum dots in amorphous silica matrix

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