Spatial Variations in the Epitaxial Growth of InP and InGaAs by Trichloride VPE and Their Physical and Chemical Origins
- D. N. Buckley
- , J. R.C. Filipe
- , F. R. Lineman
- , K. W. Wang
- , K. M. Lee
- , A. A. Westphal
- , S. M. McEwan
- , M. A. DiGiuseppe
- Nokia
Research output: Contribution to journal › Article › peer-review