Spin dynamics of polycrystalline Ni films on Si substrate

Fernando M.F. Rhen, Jeffrey F. Godsell, Terence O'Donnell, Saibal Roy

Research output: Contribution to journalArticlepeer-review

Abstract

We have prepared thin Ni films by direct electrodeposition onto Si substrates and investigated the magnetization dynamics up to 9 GHz. Films with typical thickness of 200 nm show good adhesion to the substrate. Experimental absorption spectra were fitted using a model, which combines the magnetization dynamics according to Landau-Lifshitz-Gilbert and eddy current contribution. Damping parameters ranging from 0.12 to 0.08 were obtained. These values are larger than the intrinsic damping parameter of 0.064 for Ni, which indicates that the effect of eddy current is the prime contribution to line broadening in the electrodeposited Ni/Si structure. The dependence of damping parameter on applied field also supports this idea, the larger the applied field the smaller the damping parameter is.

Original languageEnglish
Pages (from-to)1686-1689
Number of pages4
JournalJournal of Magnetism and Magnetic Materials
Volume322
Issue number9-12
DOIs
Publication statusPublished - May 2010

Keywords

  • Electrodeposition
  • LLG
  • Nickel
  • Soft

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