Abstract
The effects of growth temperature, V-III partial pressure ratio in the gas phase, and the nature of the carrier gas on the morphology of lattice matched InGaAs/InP multiple quantum well stacks are investigated. Preliminary results of an extension of this study to strained InGaAs/InP systems are presented.
Original language | English |
---|---|
Pages (from-to) | 2101-2103 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 69 |
Issue number | 14 |
DOIs | |
Publication status | Published - 30 Sep 1996 |
Externally published | Yes |