Abstract
The effects of growth temperature, V-III partial pressure ratio in the gas phase, and the nature of the carrier gas on the morphology of lattice matched InGaAs/InP multiple quantum well stacks are investigated. Preliminary results of an extension of this study to strained InGaAs/InP systems are presented.
| Original language | English |
|---|---|
| Pages (from-to) | 2101-2103 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 69 |
| Issue number | 14 |
| DOIs | |
| Publication status | Published - 30 Sep 1996 |
| Externally published | Yes |