Using spring algorithms to remove node overlapping

Wanchun Li, Peter Eades, Nikola Nikolov

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Cluttered drawings of graphs cannot effectively con- vey the information of graphs. Two issues might cause node overlapping when one draws a picture of a graph. The first issue occurs when applying a layout algorithm for an abstract graph to a practical appli- cation in which nodes are labeled. The second is the changing of a node's size in a dynamic drawing sys- Tem. This paper presents two algorithms, DNLS and ODNLS, for removing the two kinds of overlapping. The algorithms are based on the well-known spring embedder model. The outputs of the algorithms provide the features of spring algorithms. Experi- ments are carried out to compare DNLS and ODNLS to the Force Scan(FS) algorithm and its variants. The results demonstrate the advantages of DNLS and ODNLS in terms of some aesthetic criteria.

Original languageEnglish
Title of host publicationInformation Visualisation 2005 - Asia-Pacific Symposium on Information Visualisation, APVIS 2005
Pages131-140
Number of pages10
Publication statusPublished - 2005
Externally publishedYes
EventAsia-Pacific Symposium on Information Visualisation, APVIS 2005 - Sydney, NSW, Australia
Duration: 27 Jan 200529 Jan 2005

Publication series

NameConferences in Research and Practice in Information Technology Series
Volume45
ISSN (Print)1445-1336

Conference

ConferenceAsia-Pacific Symposium on Information Visualisation, APVIS 2005
Country/TerritoryAustralia
CitySydney, NSW
Period27/01/0529/01/05

Keywords

  • Graph drawing
  • Node overlapping
  • Spring algorithm

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