Vacancy-induced plastic deformation in electrodeposited copper films

S. Nakahara, S. Ahmed, D. N. Buckley, T. Tanaka Ahmed

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A tensile stress developed in polycrystalline copper films during room-temperature aging was computed using a diffusion equation for excess vacancies migrating to the grain boundaries. This theory is based on an assumption that a free volume created by the arrival of excess vacancies at the grain boundaries of thin copper films is instantly eliminated and this action introduces a biaxial tensile stress over the film plane. The tensile stress was calculated as a function of aging time, grain size, and excess vacancy concentration. It was found that the tensile stress could exceed the yield stress of copper. This result suggests that a plastic deformation could occur in electrodeposited copper films during room-temperature aging, consistent with experimental observations. copyright The Electrochemical Society.

Original languageEnglish
Title of host publicationElectrochemical Processing in ULSI and MEMS 2
PublisherElectrochemical Society Inc.
Pages167-183
Number of pages17
Edition6
ISBN (Print)9781566775175
DOIs
Publication statusPublished - 2006
Event209th ECS Meeting - Denver, CO, United States
Duration: 7 May 200611 May 2006

Publication series

NameECS Transactions
Number6
Volume2
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

Conference209th ECS Meeting
Country/TerritoryUnited States
CityDenver, CO
Period7/05/0611/05/06

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