Vapor phase etching characteristics of InP by HCl

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Journal	Proceedings of the Twenty-sixth State-of-the-art Program on Compound Semiconductors (sotapocs Xxvi)
Publication status	Published - 1997

Cite this

TY - JOUR

T1 - Vapor phase etching characteristics of InP by HCl

AU - Buckley, DN

AU - Foley, L

PY - 1997

Y1 - 1997

UR - https://publons.com/wos-op/publon/69436156/

M3 - Article

JO - Proceedings of the Twenty-sixth State-of-the-art Program on Compound Semiconductors (sotapocs Xxvi)

JF - Proceedings of the Twenty-sixth State-of-the-art Program on Compound Semiconductors (sotapocs Xxvi)

ER -